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On the possible conduction mechanisms in Rhenium/n-GaAs Schottky barrier diodes fabricated by pulsed laser deposition in temperature range of 60-400 K

Journal of Materials Science Materials in Electronics · Mayıs 2019

Özet
This study presents electrical characteristics of n-GaAs based Schottky barrier diodes (SBDs) with Rhenium (Re) rectifier contacts. The electrical characteristics of the Re/n-GaAs SBDs were investigated utilizing the forward bias current-voltage (IF-VF) data collected in temperature range of 60-400 K. The values of ideality factor (n) and zero-bias barrier height (ΦBo) were found as 9.10 and 0.11 eV for 60 K, and 1.384 and 0.624 eV for 400 K, respectively, on the basis of thermionic-emission theory. The conventional Richardson plot deviated from linearity at low temperatures and the Richardson constant value (A*) was obtained quite lower than the theoretical value for this semiconductor (8.16 A cm-2 K-2). nkT/q-kT/q plot shows that the field-emission may be dominant mechanism at low temperatures as a result of tunneling via surface states since the studied n-GaAs’s doping concentration is on the order of 1018 cm-3, i.e. at high values so leads to tunneling. On the other hand, ΦBo-n, ΦBo-q/2kT and (n-1-1)-q/2kT plots exhibit linearity but this linearity is observed for two temperature regions (60-160 K and 180-400 K) due the presence of double Gaussian distribution (GD) of the barrier height. Therefore, the standard deviation value was obtained from the plot of ΦBo-q/2kT and it was used for modifying the conventional Richardson plot into the modified Richardson plot by which the values of mean barrier height and A* were obtained as 0.386 eV and 15.55 A cm-2 K-2 and 0.878 eV and 8.35 A cm-2 K-2 for the low and high temperature regions, respectively. As a result, IF-VF-T characteristics of the Re/n-GaAs SBDs were successfully elucidated by double-GD of barrier height.
29 atıf Mayıs 2019 DOI
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YÖKSİS Kayıtları
On the possible conduction mechanisms in Rhenium/n-GaAs Schottky barrier diodes fabricated by pulsed laser deposition in temperature range of 60\u2013400 K
Journal of Materials Science: Materials in Electronics · 2019 SCI-Expanded
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Makale Bilgileri

Toplam Atıf 29 atıf · Scopus
ISSN09574522
Yayın TarihiMayıs 2019
Cilt / Sayfa30 · 9029-9037

Havuzumuzdaki Atıflar 0

Bu makaleye, sistemimizdeki Scopus veritabanında bulunan 0 makale atıf yapmıştır. Scopus genel atıf sayısı: 29.

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Scimago Dergi (ISSN Eşleşmesi)
Journal of Materials Science: Materials in Electronics
Q2
SJR Skoru0,493
H-Index117
YayıncıSpringer New York
ÜlkeUnited States
Atomic and Molecular Physics, and Optics (Q2)
Condensed Matter Physics (Q2)
Electrical and Electronic Engineering (Q2)
Electronic, Optical and Magnetic Materials (Q2)
Bioengineering (Q3)
Biomaterials (Q3)
Biomedical Engineering (Q3)
Biophysics (Q3)
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